Silicon Etch
North Cleanroom
1.738
Acid hood with KoH Do NOT remove Labware from this tool!
Potassium ions are high contaminants for CMOS devices
KOH solution for etching Si. Do not leave the solution unattended!
Please decontaminate labware and samples with 5:1:1 H20:H202:HCl according to the procedure posted on the Hood, after KOH wet etch.