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Anneal (Doped) - MRL
MRL Atmospheric Furnace, RCA Preclean Required in Diffusion Bay General Hood
Compatible Materials:
Si/SiGe, Doping > 1x1018cm-3; N/N+ or P/P+ "epi" wafers
Incompatible Materials:
Metals / Hi K / III-V
- Log on to the tool using the LabAccess terminal.
- Open Zone/Tool Tab and Select C5 - right rack (Oxide and anneal furnace, atmospheric) or C4 - left rack (PoCl3 adn LPCVD) Open Run Tool Icon
- Select the desired recipe (new recipes must be approved and created by the maintenance staff). Select the furnace tube C4-1 for PoCl3
- Run mini recipe
- Pop up Window 1 - Run Tool Login Input user ID
- Pop up Window 2 - Operator step only. Enter the desired process time.
- Pop up Window 3 - Information to check Downloading recipe - CHECK run number and if the Download has been successful
- Enter run data (user, recipe, deposition time) in log book.
- Open the tube status window
- Control the desired furnace
- Select START (to load and start the recipe)
- Place wafers in boat (this should be done on the load platform with clean tools and on cleanroom wipes to prevent contamination of the boat; use vinyl gloves to handle elephant, sled and boat; use Teflon tweezers to avoid metal contamination) including buffer wafers to ensure more uniform device wafers. Growth side of wafer should be facing the heater wall
- Transfer the boat into the furnace with the rod.
- Replace furnace cover.
- In the tube status window select HOLD (to load samples, and release the recipe)
- Wait for the process to run automatically.
- Wait for load/unload step.
- Use rod to remove the boat from the furnace.
- Replace furnace cover.
- Re-open the POCl furnace status window, select the control button, and select hold to remove the load/unload hold.
- Allow boat and wafers to cool while waiting for recipe to finish running (around 20min).
- After process is complete, reopen the process loader.
- Select the POCl furnace.
- Choose the Idle recipe.
- Enter MRL control password and select load recipe.
- Open the POCl furnace status window.
- Select control button.
- Select start.
- Unload the wafers again using cleanroom wipes and clean tools to prevent contamination to the boat.
Log off of the tool using the LabAccess terminal.