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Diffusion Field Oxide - BRUTE- Undoped Tube #4

Diffusion Field Oxide - BRUTE- Undoped Tube #4

Diffusion
North Cleanroom
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Tube #4 (the top one, in the rack closest from the cleanroom windows)

Brute Atmospheric Furnace, Piranha Clean Required (unless wafer is coming out of diffusion tube)

Compatible Materials: 
Si / SiGe, Doping < 1x1018cm-3; N/N+ or P/P+, General purpose oxidation (wet or dry) and annealing.
Incompatible Materials: 
Metals / Hi K / III-V / Photoresist

1. Log on to the tool using the LabAccess terminal.
2. Log off of the tool using the LabAccess terminal.
used by Julian Cheng's group for water steam production