Website Undergoing Updates
We are in the process of redesigning our website. Some pages may be incomplete or outdated. Please bear with us during this transition.

You are here

Diffusion Oxide - BRUTE - Undoped - 4"

Diffusion
North Cleanroom
1.756

Tube # 3 (bottom tube, second rack: the further away off the cleanroom window)

Brute Atmospheric Furnace, Piranha Clean Required (unless wafer is coming out of diffusion tube)

 

Compatible Materials: 
Si/SiGe, Doping < 1x1018cm-3; N/N+ or P/P+, General purpose oxidation (wet or dry) and annealing.
Incompatible Materials: 
Metals / Hi K / III-V / Photoresist

1. Log on to the tool using the LabAccess terminal.
2. Log off of the tool using the LabAccess terminal.

Used for Pyrex (that ontains ions) annealing