Silicon Etch
North Cleanroom
1.750
Description: RIE Etcher
Features: up to 8" wafers
chamber gases: CH4, N2, H2, Ar, CHF3, Cl2, SF6, Ar
cold chuck (-15°C)
turbo pump
Compatible Materials:
Si / SiGe / Polymer
Website Undergoing Updates
We are in the process of redesigning our website. Some pages may be incomplete or outdated. Please bear with us during this transition.
Description: RIE Etcher
Features: up to 8" wafers
chamber gases: CH4, N2, H2, Ar, CHF3, Cl2, SF6, Ar
cold chuck (-15°C)
turbo pump
© 2013 Microelectronics Research Center | Department of Electrical and Computer Engineering | The University of Texas at Austin