III-V Metals
North Cleanroom
1.748
Heatpulse 610 RTA (Rapid Thermal Anneal)
Features: Chamber could process up to 6" wafer
Gases: N2, O2, forming gas, 5% O2 diluted in N2
Pyrometer to control temperature
Run time vs. temperature:
450°C for 1 hour
900°C no more than 10 minutes
1000°C no more than 5 minutes
1100°C no more than 2 minutes
1150°C no more than 60 seconds
Compatible Materials:
III-V Only