790 RIE Plasma Therm #2,50
790 RIE Plasma Therm #1,50
AET,50
AG Associates,50
Alphastep - Tencor,10
BatchTop RIE,50
Biorad,50
Brute - 4 Field Oxide (Undoped),50
Brute - 4 Sinter,50
Brute - 4POCl,50
CHA,50
Clean SRD,10
Digital Instruments - 505811,25 - Atomic force microscope
digital instruments #2,50 - Atomic force microscopy
Etch SRD,10
EVG Aligner,50
Fab Entry Hood,10
HMDS Oven,50
Hood C11 - WPS,10
Hood C14 - WPS,10
Hood C16 - WPS,10
Hood E02 - WPS,10
Hood E05 - WPS,10
Hood F03 - WPS,10
Hood F06 - WPS,10
Hood F09 - WPS,10
Hood G08 - WPS,10
Hood G11 - WPS,10
Hood G12 - WPS,10
Hood G14 - WPS,10
Hood H03 - WPS,10
Hood H06 - WPS,10
Hood H14 - WPS,10
Hood H15 - WPS,10
Hood H16 - WPS,10
Hood H18 - WPS,10
Hood J19 - WPS,10
Hood J21 - WPS,10
Hood J23 - WPS,10
Hood J24 - WPS,10
Hood L10 - WPS,10
Imprio 100,50
HTG Mask Aligner,50
JOEL 6400 - Elect. Microscope,50 
JOEL333T- Elect. Microscope,50
K.SUSS #1,50
K.SUSS #579,50
KJL(New),50
KJL(Old),50
Lasar Microscope - 1LM21H,10
Laser Microscope OLS4100, 25
Leybold,50
March Asher,50
MRL- Anneal (Doped),50
MRL- Anneal (Undoped),50
MRL- Field Oxide,50
MRL- Gate Oxide,50
MRL- LPCVD Nitirde,50
MRL- LPCVD Polysilicon,50
MRL- LTO,50
MRL- POCl,50
NANO SPEC,10
NANO SPEC/AFT,10
Ney oven,0
Orange RIE,50
Oxford RIE,50
PTL - LPCVD Nitride,50
PTL- LPCVD Polysilicon,50
PTL- LTO,50
Rudalph Elipsometer,10
SAT1 - Semitool,10
SAT2 - Semitool,10
SRD1 - Verteq,10
SRD2 - Verteq,10
SFIL Mask Aligner,50
Varian Sputterer,50
VEECO AP-150,10
XRD,50
e-beam,50
Olympus,50
E-Beam Aligner,50
Probe Station, 50
JJ Woollam elipsometer, 20
Trion RIE, 50
8 inch spinner/hotplate,10
Lab Use, 1000
Lakeshore, 35
TEM, 50
Mini Brute furnace, 10
workshop, 0
Dektak 150, 20
Ney oven,0
Carl Zeiss SEM,50
KJL South,50 _ Sputter
Westbond Wire bonder, 50
ALD Lee, 40
ALD Lee, 40
ALD Banerjee, 50
ADT Dicing saw, 12
CMP, 20
Template Blank, 600
Denton Evaporator, 50
AW610, 50
Karl Suss MJB4, 50
Brute - 4Field Oxide (Undoped), 50
Brute - 4Sinter, 50
PTL- LTO, 50
CHA #1, 50 _E-beam evaporators for metal
CHA #2, 50 _ E-beam evaporator for oxides and metals
AW 610, 50
AW 610 Silicon, 50
Karl Suss MA6, 50 _ Photolitography aligner
Focused Ion Beam, 50
SEM SUPRA 40VP, 100
Oxford ICP_Etcher, 50
Emitech Coater, 30
Plasma Therm Si deep RIE, 50
FEI / FIB, 65
Univex sputterer, 50
8 inch SRD, 10
Tepla Microwave Asher, 50
Fiji ALD, 50
TM-Hi Vac Oven, 10
Lab Use - PrivaTran, 1500
EP- 1 Nickel, 30
EP-2 Nickel, 30
LAM Etcher,50
STS ICP Etcher, 50
Parylene Oven, 30
UV Ozone System, 10
Raith, 50