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Process Equipment
| Name | Area | Location |
Type |
|---|---|---|---|
| NASCENT nmFab Services | South Cleanroom | ||
| Maskless Lithography – Bruker Lightning | South Cleanroom | ||
| Diffusion Pre-clean Acid Hood (Gate) C-11 | North Cleanroom | 1.756 | Diffusion |
| LPCVD LTO PTL | North Cleanroom | 1.756 | Diffusion |
| Spin Rinse Dryer Verteq 1 & 2 (No Photoresist, no Metal) | North Cleanroom | 1.756 | Diffusion |
| Anneal (Doped) - MRL | North Cleanroom | 1.756 | Diffusion |
| Anneal (Field Oxide) - MRL | North Cleanroom | 1.756 | Diffusion |
| PECVD (790 Plasma Therm #1) | North Cleanroom | 1.750 | Diffusion |
| Anneal (Gate Oxide) - MRL | North Cleanroom | 1.756 | Diffusion |
| UV Ozone cleaner | North Cleanroom | 1.756A | Diffusion |
| Anneal (Undoped) - MRL | North Cleanroom | 1.756 | Diffusion |
| Vacuum Oven (Blue vacuum Oven) | South Cleanroom | Diffusion | |
| Diffusion Doping POCl3 - MRL | North Cleanroom | 1.756 | Diffusion |
| LPCVD Nitride - MRL | North Cleanroom | 1.756 | Diffusion |
| LPCVD Amorphous silicon - MRL | North Cleanroom | 1.756 | Diffusion |
| Wafer Bonder AML | North Cleanroom | 1.728 | Diffusion |
| LPCVD Low Temp Oxide - MRL | North Cleanroom | 1.756 | Diffusion |
| Diffusion Oxide - BRUTE - Undoped - 4" | North Cleanroom | 1.756 | Diffusion |
| Diffusion Field Oxide - BRUTE- Undoped Tube #4 | North Cleanroom | Diffusion | |
| Diffusion Gate Oxide - BRUTE - 4" Tube #5 | North Cleanroom | 1.756 | Diffusion |
| Diffusion Sintering -BRUTE- 4" Tube #6 | North Cleanroom | 1.756 | Diffusion |
| Rapid Thermal Process -AET- | North Cleanroom | 1.756A | Diffusion |
| Spin Rinse Dryer SAT (no PR. no Metal) | North Cleanroom | 1.756 | Diffusion |
| Diffusion Pre-clean Acid Hood C-16 | North Cleanroom | 1.756 | Diffusion |
| LPCVD Nitride PTL | North Cleanroom | 1.756 | Diffusion |
| Rapid Thermal Anneal Silicon -Allwin 610 - | North Cleanroom | 1.756A | Diffusion |
| Diffusion Pre-clean Acid Hood C-14 | North Cleanroom | 1.756 | Diffusion |
| LPCVD PolySilicon PTL | North Cleanroom | 1.756 | Diffusion |
| Atomic Force Microscope - DI3000 | North Cleanroom | 1.728 | Metrology |
| Atomic Force Microscope BRUKER Icon - New | North Cleanroom | 1.728 | Metrology |
| Optical Microscopes Olympus BX51 | North Cleanroom | Metrology | |
| TriboIndenter TI 950 : Nanomechanical characterization | South Cleanroom | 1.205 | Metrology |
| Optical Microscope Olympus BH-2 | North Cleanroom | Metrology | |
| Spectrophotometer Nanospec AFT 180 | North Cleanroom | 1.7 | Metrology |
| Spectrophotometer Nanospec Reflectometer AFT | North Cleanroom | 1.7 | Metrology |
| Optical Confocal Microscope LEXT Olympus | North Cleanroom | 1.7 | Metrology |
| Four-point probe Veeco FPP5000 | North Cleanroom | 1.7 | Metrology |
| E-line Raith - Electron beam lithography | North Cleanroom | 1.730A | Metrology |
| Ellipsometer J.A. Woollam M-2000 DI | North Cleanroom | 1.730 | Metrology |
| Optical Profilometer -Dektak 150 | North Cleanroom | 1.748 | Metrology |
| TEM TECNAI G2 F30 X-TWIN | North Cleanroom | 1.824 | Metrology |
| SEM ZEISS Neon 40 - Bruker EDS - Raith Elphy pattern generator | North Cleanroom | 1.730A | Metrology |
| Plasma Cleaner _TEM holder | North Cleanroom | TEM TECNAI Room | Metrology |
| XRD Rigaku SmartLab | North Cleanroom | 1.802 | Metrology |
| Sputter Coater Emitech K575X -SEM sample preparation | North Cleanroom | Metrology | |
| HMDS - YES Oven | North Cleanroom | 1.720 | Silicon Lithography |
| Photolithography i-g line mask aligner SussMicrotec -MA6/BA6 | North Cleanroom | 1.720 | Silicon Lithography |
| Photoresist Spin Coater - L10 (no Au) | North Cleanroom | 1.720 | Silicon Lithography |
| Photolithography E-beam writer Jeol 6000 FSE | North Cleanroom | 1.720A | Silicon Lithography |
| Photoresist Spin coater- Brewer Science | North Cleanroom | 1.720 | Silicon Lithography |
| Asher (Microwave) 300 PVA Tepla | North Cleanroom | 1.720 | Silicon Lithography |
| Asher Nordson March PX-250 | North Cleanroom | 1.720 | Silicon Lithography |
| Sputter DC/RF- KJL(NEW) | North Cleanroom | 1.736 | Silicon Metals |
| Acid Hood - G12 & G14- Metal etch (no Au) | North Cleanroom | 1.736 | Silicon Metals |
| Solvent Hood - G8 & G11 - Cr/Al etch | North Cleanroom | 1.736 | Silicon Metals |
| ALD Cambridge NanoTech SavannahTM 200 | North Cleanroom | 1.704 | Silicon Metals |
| ALD Fiji w/ remote plasma & ozone generator | North Cleanroom | 1.756 | Silicon Metals |
| Electroplating - Nickel | South Cleanroom | Silicon Metals | |
| Furnace (Sintering ) - MiniBrute | North Cleanroom | 1.824 | Silicon Metals |
| Sputter DC Aluminum/ Ti - UNIVEX450 | North Cleanroom | 1.736 | Silicon Metals |
| Thermal Evaporator (Metal Deposition) - Veeco | North Cleanroom | 1.736 | Silicon Metals |
| Acid Hood - H16 & H18- KoH Etch | North Cleanroom | 1.738 | Silicon Etch |
| Etcher ICP Deep Silicon PlasmaTherm Versaline | North Cleanroom | 1.738 | Silicon Etch |
| Etcher ICP 2300 Exelan Flex LAM | North Cleanroom | 1.750 | Silicon Etch |
| Etcher ICP STS | North Cleanroom | 1.736 | Silicon Etch |
| Etcher Trion Oracle | North Cleanroom | 1.750 | Silicon Etch |
| Etcher RIE Oxford 80 | North Cleanroom | 1.750 | Silicon Etch |
| Etcher RIE Batchtop PlasmaTherm | North Cleanroom | 1.738 | Silicon Etch |
| Etcher RIE 790 Plasma Therm #2 | North Cleanroom | 1.738 | Silicon Etch |
| Solvent Hood - H03 (No Au) | North Cleanroom | 1.738 | Silicon Etch |
| Acid Hood - H14 & H15- Resist removal (no Au) | North Cleanroom | 1.738 | Silicon Etch |
| Chemical-mechanical planarization (CMP) | North Cleanroom | Diffusion Back Aisle | Silicon Etch |
| Wire Bounder West-bond 7400A | South Cleanroom | 2.406 | Packaging |
| Dicing Saw ACT | South Cleanroom | 2.406 | Packaging |
| Wire bonder (Au ball ) Kulicke & Soffa | South Cleanroom | 2.406 | Packaging |
| Photolithography i-g line mask aligner - EVG | North Cleanroom | 1.728 | III-V Lithography |
| Photolithography i-g line mask aligner - MJB4 Suss Microtec | North Cleanroom | 1.728 | III-V Lithography |
| Wafer Press | North Cleanroom | 1.728 | III-V Lithography |
| Acid Hood - WPS - J19 | North Cleanroom | 1.728 | III-V Lithography |
| Photoresist Spin coater J21 - J23 | North Cleanroom | 1.728 | III-V Lithography |
| Solvent Hood - WPS - J24 | North Cleanroom | 1.728 | III-V Lithography |
| Rapid Thermal Anneal - AG Associates-Allwin610 III-V | North Cleanroom | 1.748 | III-V Metals |
| E-beam evaporator CHA#1 | North Cleanroom | 1.748 | III-V Metals |
| E-beam Evaporator & Ion Assisted - CHA#2 | North Cleanroom | 1.748 | III-V Metals |
| Acid Hood - WPS - E02 | North Cleanroom | 1.748 | III-V Metals |
| Solvent Hood - E05 Lift off applications | North Cleanroom | 1.748 | III-V Metals |
| sputtering KJL south cleanroom | South Cleanroom | III-V Metals | |
| E-beam evaporator CHA#3 | North Cleanroom | 1.748 | III-V Metals |
| Ion miller Oxford ionfab 300 | South Cleanroom | III-V Etch | |
| Etcher RIE 790 Plasma Therm #1 | North Cleanroom | 1.750 | III-V Etch |
| Solvent Hood - WPS - F03 | North Cleanroom | 1.750 | III-V Etch |
| Acid Hood - WPS - F06 | North Cleanroom | 1.750 | III-V Etch |
| Etcher ICP Oxford 100 | North Cleanroom | 1.750 | III-V Etch |